Semiconductor Technologies Guide 81
An anonymous reader writes "X-bit labs have posted an interesting article on manufacturing technologies used in the semiconductor industry. Good reading if you want to get a really indepth idea of technologies used for semiconductor manufacturing by IBM, Intel, AMD, and others."
Nano-tube technology and it's application: (Score:5, Interesting)
The article talks about "spontaneous electron movement from the negatively charged silicon substrate of the channel to the positively charged gate."
I guess I am just curious as I recently wrote a paper on their applications and I would like to hear from someone a little more technically knowledgable than me. Anyone have any real knowledge or some *easy* links they could share?
Re:Nano-tube technology and it's application: (Score:5, Informative)
Here's a simplified explanation. Think of a switch with source at one terminal and drain on the other. When sitting without a voltage on the gate, the source and drain are not connected. When the switch is turned on (ie. gate high), electrons are allowed through the pathway created.
Anyways, the yellow in the diagram is an insulator. The switching is all done without touching the doped silicon connecting the source and the drain. My point is that the silicon needs to be there. It's integral to how the switching works. I don't know anything about nano-tubes but it cannot replace the silicon unless it can act like a semiconductor (both as a conductor and insulator depending on temp, etc). Perhaps it could replace the SiO2 currently used as the insulating layer but no matter what, the smaller the channels get, the more the electrons are going to want to jump..
Anyone that knows more about SOI want to comment?
Re:Nano-tube technology and it's application: (Score:3, Informative)
Semiconducting CNTs occur when you put a twist on the CNT - i don't know the mechanism for that nor the theory behind it, but it is unrelated
Re:Nano-tube technology and it's application: (Score:1)
silicon, and even electrons, are not critical to the operation of all transistors.
Re:Nano-tube technology and it's application: (Score:2, Informative)
Re:Nano-tube technology and it's application: (Score:1, Informative)
I believe they can only be grown at the moment on AFM tips, or at least that is the only way they can really test them at the moment.
Re:Nano-tube technology and it's application: (Score:2, Informative)
On a small scale t
woah (Score:5, Funny)
Re:woah (Score:2)
check out the comparison b/c transistor and virus (Score:5, Insightful)
I don't think it shows the smallness of the transistor as much as I suddenly realized how much further we have to go before hitting biological complexity.
the surface of the virus has crazy number of protein receptors that allows it to latch onto only the proper cells, and inside a strand of genetic material that contains thousands, if not millions of ACGT pairs - which puts information density of our most hardcore RAM at a great shame. Actually there are probably other stuff inside, but IANAVirologist.
Looooong road ahead...
side note: I don't think the gearheads are so obsessed about the manufacturing process for cars, nor the martha-stuart followers the manufacturing process for triple flower-pattern guest-only bath towels, why are geeks sooooo into the photolithography process?
Anybody wants to offer an explanation?
Re:check out the comparison b/c transistor and vir (Score:2, Insightful)
Actually it's 1501 base pairs (so 3002 bits of information) in one strain of the Influenza B [nih.gov] virus.
Re:check out the comparison b/c transistor and vir (Score:3, Insightful)
Perhaps; but we can write and rewrite to our "most hardcore RAM" much faster than genetic information in ACGT pairs can mutate.
Re:check out the comparison b/c transistor and vir (Score:4, Informative)
Re:check out the comparison b/c transistor and vir (Score:5, Funny)
Easy question (Score:2)
Besides, photolithography is hella cool.
Re:On the subject (Score:1, Funny)
etching (Score:5, Interesting)
Conventional etching uses plasma. Plasma is a soup of charged particles of energy of the order of a kev (1000 electron volts). It's use is mostly dictated by the fact that we understand how to create it quite well, rather than in our understanding of what is/are the consituents of plasma that actually effect the etching action.
What is found that the etching process sensitive to the charge element, to the quantum state of the incident ions, to its energy, to the angle of incidence. And of course this is purely from the beam side, from the surface point of view there are a lot more variables...
Did you know that the molecular process that does etching is very similar to that that creates a radio blackout in the space shuttle while reentry? Somewhat cool
Re:etching (Score:2)
etching for silicon is more likely to done with a chemical etch (pirhanna sol'n, HF, etc.) than a physical one.
Re:etching (Score:3, Informative)
Boy, thats 70ies stuff. Today, wet processing is avoided as much as it is possible. But you are right in one point, purely physical etching is not used frequently. However there are combined physical/chemical methods. Do a websearch on Reactive Ion Etching, Plasma Etching etc.
Just 50 comments in 2 hours? (Score:1, Funny)
General semiconductor physics information (Score:2, Funny)
http://www.britneyspears.ac/lasers.htm
Re:This article officially owned by trolls (Score:2)
What's the official troll ownage ratio? 2/3?
M of N gates (Score:1)
Could the Tri-Gate transitor be a major boon to producing M of N gates with hysterisis? The asynchonous logic proponents would love this. I'm thinking you would might need more layers of interconnects.
Anybody ideas?
holy poorly written batman! (Score:4, Insightful)
"Besides, the characteristics of the channel become more predictable, while the transistor itself - more robust to various errors, like those provoked by space particles that may get into the channel and ionize it."
i'm not even going to get into the english, which quite frankly is horrid. "robust to errors"? "space particles" (yes i know what he's trying to say)? "ionize it"? ionize the channel? (yes again, i understand he means the carriers, but that's not what happens)
most of his information is unsubstantiated at best. There are no references nor citations. Most of it seems somewhat accurate but only because i understand what they were TRYING to say. If i didn't know about fab tech to begin with i would have been very misled.
If you want to know about semiconductor fabrication technology, do yourself a favor and borrow a textbook from your EE budies, then read up in journals.
Re:holy poorly written batman! (Score:2, Informative)
I take it you don't read many articles on the web...
Anyway I agree the article is not really well written and the English is horrible, but it does give a nice, though very simplified, overview of some of the key problems of semiconductor processing and what various companies are doing to overcome them.
Being completely technically accurate for such an article is quite difficult. For example, when discussing